Vapor chamber with integrally formed wick structure and method of manufacturing same

ABSTRACT

A vapor chamber includes a main body and a wick structure. The main body includes a first and a second plate, which are closed to each other to define a chamber therein between. A working fluid is filled in the chamber. The wick structure is integrally formed on two facing inner surfaces of the first and the second plate by way of mechanical processing, and is projected from the first and second plates toward a central space in the chamber. By integrally forming the wick structure on the first and second plates, the vapor chamber can be manufactured at reduced time and labor to obtain increased yield. A method of manufacturing vapor chamber with integrally formed wick structure is also disclosed.

FIELD OF THE INVENTION

The present invention relates to a vapor chamber with integrally formedwick structure, and more particularly to a vapor chamber with integrallyformed wick structure that can be manufactured at reduced time and laborto obtain increased yield. The present invention also relates to amethod of manufacturing vapor chamber with integrally formed wickstructure.

BACKGROUND OF THE INVENTION

Due to the constant progress in many technological fields, electronicelements now have largely increased power and performance, which,however, also brings the electronic elements to generate more heatduring the operation thereof. The generated heat must be timely removed,lest it should accumulate in the electronic elements to adversely affectthe performance or even cause burnout of the electronic elements. Toeffectively solve the problem of heat dissipation in differentelectronic devices and elements, vapor chambers with better heattransfer effect have been developed from time to time.

A prior art vapor chamber usually includes a chamber and a wickstructure provided in the chamber. A working fluid is filled in thechamber. The wick structure provided in the chamber or on inner surfacesof the chamber may be sintered powder, metal meshes, or fibers. One sideof the vapor chamber is a vaporizing zone that is in contact with aheat-generating element, such as a central processing unit, a graphicschip, a south bridge chip, a north bridge chip, or a communication chip,to absorb the generated heat. The liquid-phase working fluid in thechamber near the vaporizing zone is heated by the absorbed heat andvaporized into a vapor-phase working fluid, which flows toward andaccordingly transfers heat to the other side of the vapor chamber, i.e.a condensing zone. At the condensing zone, the vapor-phase workingliquid is cooled and condensed into a liquid-phase working fluid again.The liquid-phase working fluid flows back to the vaporizing zone throughgravity force or the wick structure to continue the cycles ofvapor/liquid phase conversion and thereby achieve the temperaturelowering and heat dissipating effects.

While the prior art vapor chamber may achieve the effect of loweringtemperature, it has another problem with the wick structure thereof. Thewick structure in the prior art vapor chamber is attached to the innersurfaces of the chamber through sintering, for example, instead of beingintegrally formed thereon. Thus, the wick structure tends to separatefrom the inner surfaces of the vapor chamber when the latter issubjected to some external factors, such as deformation caused bycollision, compression and the like, resulting in unmovable workingfluid in the chamber and accordingly, lowered heat transfer efficiencyof the vapor chamber.

Furthermore, the manufacture of the prior art vapor chamber involvesrather complicated procedures to provide the wick structure in the formof sintered powder, metal meshes or fibers in the chamber. Thecomplicated procedures for forming the wick structure in the vaporchamber would inevitably require more labor and time to reduce theyield.

In conclusion, the prior art vapor chamber has the followingdisadvantages: (1) consuming more time and labor; (2) having loweredyield; and (3) involving complicated manufacturing procedures.

It is therefore tried by the inventor to develop an improved vaporchamber with integrally formed wick structure and a method formanufacturing same, so as to eliminate the drawbacks in the prior artvapor chamber.

SUMMARY OF THE INVENTION

A primary object of the present invention is to provide a vapor chamberwith integrally formed wick structure, so as to save the time and laborneeded to manufacture the vapor chamber.

Another object of the present invention is to provide a vapor chamberwith integrally formed wick structure to enable increased yield thereof.

A further object of the present invention is to provide a method ofmanufacturing vapor chamber with integrally formed wick structure, so asto save the time and labor needed to manufacture the vapor chamber.

A still further object of the present invention is to provide a methodof manufacturing vapor chamber with integrally formed wick structure toenable increased yield thereof.

To achieve the above and other objects, the vapor chamber withintegrally formed wick structure according to the present inventionincludes a main body and a wick structure. The main body includes afirst and a second plate, which are closed to each other to define achamber therein between. A working fluid is filled in the chamber. Thewick structure is integrally formed on two facing inner surfaces of thefirst and the second plate by way of mechanical processing, and isprojected from the first and second plates toward a central space in thechamber. By integrally forming the wick structure on the first andsecond plates, the vapor chamber can be manufactured at reduced time andlabor to obtain increased yield.

To achieve the above and other objects, the method of manufacturingvapor chamber with integrally formed wick structure according to thepresent invention includes the following steps: providing a first and asecond plate; forming a wick structure on two facing inner surfaces ofthe first and the second plate by way of mechanical processing; closingthe first and the second plate to each other to thereby define a chambertherein between; evacuating the chamber, filling the chamber with aworking fluid, and sealing the chamber. With the method of manufacturingvapor chamber with integrally formed wick structure according to thepresent invention, the manufacturing process for a vapor chamber iseffectively simplified to achieve the effects of saving time and laboras well as increased yield.

BRIEF DESCRIPTION OF THE DRAWINGS

The structure and the technical means adopted by the present inventionto achieve the above and other objects can be best understood byreferring to the following detailed description of the preferredembodiments and the accompanying drawings, wherein

FIG. 1 is an assembled perspective view of a vapor chamber withintegrally formed wick structure according to the present invention;

FIG. 2 is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a first embodiment of thepresent invention;

FIG. 3 is a sectional view of the vapor chamber with integrally formedwick structure according to the first embodiment of the presentinvention;

FIG. 4 is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a second embodiment of thepresent invention;

FIG. 5A is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a third embodiment of thepresent invention;

FIG. 5B is an exploded perspective view of a variant of the vaporchamber with integrally formed wick structure according to the thirdembodiment of the present invention;

FIG. 6A is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a fourth embodiment of thepresent invention;

FIG. 6B is an exploded perspective view of a variant of the vaporchamber with integrally formed wick structure according to the fourthembodiment of the present invention;

FIG. 7 is a flowchart showing the steps included in a first method ofmanufacturing a vapor chamber with integrally formed wick structureaccording to the present invention;

FIG. 8 is a flowchart showing the steps included in a second method ofmanufacturing a vapor chamber with integrally formed wick structureaccording to the present invention; and

FIG. 9 is a flowchart showing the steps included in a third method ofmanufacturing a vapor chamber with integrally formed wick structureaccording to the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present invention will now be described with some preferredembodiments thereof and with reference to the accompanying drawings. Forthe purpose of easy to understand, elements that are the same in thepreferred embodiments are denoted by the same reference numerals.

Please refer to FIG. 1 that is an assembled perspective view of a vaporchamber with integrally formed wick structure according to the presentinvention, and to FIGS. 2 and 3 that are exploded perspective view andassembled sectional view, respectively, of the vapor chamber withintegrally formed wick structure according to a first embodiment of thepresent invention. As shown, the vapor chamber includes a main body 1and a wick structure 15. The main body 1 includes a first plate 11 and asecond plate 12, which are closed to each other to define a chamber 14therein between. The chamber 14 is filled with a working fluid, such aspurified water, inorganic compounds, alcohols, ketones, liquid metals,coolants, or organic compounds.

An outer side of the second plate 12, i.e. a vaporizing zone of thevapor chamber, is in contact with a heat-generating element, such as acentral processing unit, a graphics chip, a south bridge chip, a northbridge chip, a communication chip and the like (not shown), forabsorbing heat generated by the heat-generating element. The workingfluid in the chamber 14 located at an inner side of the second plate 12is heated by the absorbed heat and vaporized into a vapor-phase workingfluid. The vapor-phase working fluid flows to the first plate 11, whichis also a condensing zone of the vapor chamber, and is cooled andcondensed into a liquid-phase working fluid. The liquid-phase workingfluid flows back to the vaporizing zone through gravity force or thewick structure 15 to continue the cycles of vapor/liquid phaseconversion to thereby enable effective and excellent temperature lowingand heat dissipating effects.

As can be seen in FIGS. 2 and 3, the wick structure 15 is provided ontwo inner surfaces of the first and the second plate 11, 12 that facingtoward each other, and is projected toward a central space in thechamber 14. In other words, the wick structure 15 is integrally formedon the first and the second plate 11, 12 at the two facing innersurfaces thereof.

In the illustrated first embodiment, the wick structure 15 is configuredas two roughened surfaces (see FIG. 2). However, it is understood thewick structure 15 is not necessarily limited to the roughened surfacesbut may include a plurality of grooves as shown in FIG. 3, or aplurality of grids.

With the wick structure 15 being integrally formed on the two facinginner surfaces of the first and second plates 11, 12, it is possible toeffectively avoid undesired separation of the wick structure 15 from thefirst and second plates 11, 12 and therefore ensure stable quality andenhanced heat transfer effect of the vapor chamber. Furthermore, byintegrally forming the wick structure 15 with the first and secondplates 11, 12, it is able to save the labor and time for manufacturingthe vapor chamber.

FIG. 4 is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a second embodiment of thepresent invention. As shown, the second embodiment is generallystructurally similar to the first embodiment, except for a radiating finunit 2 provided on an outer surface of the first plate 11. The radiatingfin unit 2 includes a plurality of radiating fins 21 outward extendedfrom the outer surface of the first plate 11 to enable quicker coolingof the vapor-phase working fluid for the same to convert into theliquid-phase working fluid.

FIG. 5A is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a third embodiment of thepresent invention. As shown, the third embodiment is generallystructurally similar to the first embodiment, except for at least onesupporting structure 17. The supporting structure 17 may be selectivelyprovided on the inner surface of the first or the second plate 11, 12having the wick structure 15 formed thereon. That is, the supportingstructure 17 is also integrally formed with the first plate 11 or thesecond plate 12 to locate on the surface having the wick structure 15formed thereon. In the illustrated third embodiment, two spacedsupporting structures 17 are formed on the inner surface of the firstplate 11. However, it is understood the present invention is notnecessarily limited thereto.

By forming the supporting structure 17, the first and the second plate11, 12 facing toward each other are effectively supported by thesupporting structure 17 to prevent or resist deformation of the vaporchamber due to an external factor, such as a compressive force appliedthereto.

FIG. 5B is an exploded perspective view showing a variant of the thirdembodiment of the present invention. The variant of the third embodimentis mainly characterized by a radiating fin unit 2 provided on the outersurface of the first plate 11. The radiating fin unit 2 includes aplurality of radiating fins 21 to enable quicker cooling of thevapor-phase working fluid for the same to convert into the liquid-phaseworking fluid.

FIG. 6A is an exploded perspective view of a vapor chamber withintegrally formed wick structure according to a fourth embodiment of thepresent invention. As shown, the fourth embodiment is generallystructurally similar to the first embodiment, except for a plurality ofsupporting structures 17. The supporting structures 17 are provided onthe inner surfaces of the first and the second plate 11, 12 having thewick structure 15 formed thereon. That is, the supporting structures 17are also integrally formed with the first plate 11 and the second plate12 to locate on the two facing inner surfaces having the wick structure15 formed thereon. The supporting structures 17 not only reinforce orstrengthen the structure of the first and the second plate 11, 12, butalso provide good support effect to the first and the second plate 11,12 when they are closed to each other.

With the supporting structures 17 integrally formed on the two facinginner surfaces of the first and the second plate 11, 12, the first andsecond plates 11, 12 are effectively supported and structurallyreinforced by the supporting structures 17 to effectively prevent thevapor chamber from deformation due to an external factor, such as acompressive force applied thereto.

FIG. 6B is an exploded perspective view showing a variant of the fourthembodiment of the present invention. The variant of the fourthembodiment is mainly characterized by a radiating fin unit 2 provided onthe outer surface of the first plate 11. The radiating fin unit 2includes a plurality of radiating fins 21 to enable quicker cooling ofthe vapor-phase working fluid for the same to convert into theliquid-phase working fluid.

FIG. 7 is a flowchart showing the steps included in a first method ofthe present invention for manufacturing a vapor chamber with integrallyformed wick structure according to the first embodiment of the presentinvention. Please refer to FIG. 7 along with FIGS. 2 and 3. In the firstmethod of manufacturing vapor chamber with integrally formed wickstructure, steps S1, S2, and S3 are included.

In the step S1, a first plate and a second plate are provided.

More specifically, a first plate 11 and a second plate 12 are provided.

In the step S2, a wick structure is formed on two facing inner surfacesof the first and the second plate by way of mechanically processing.

More specifically, the first and the second plate 11, 12 are machined ontheir two facing inner surfaces, such as by stamping, rolling, slotting,or milling, so that a wick structure 15 is formed on the two facinginner surfaces of the first and second plates 11, 12. That is, the wickstructure 15 is integrally formed on the two facing inner surfaces ofthe first and the second plate 11, 12. The wick structure 15 may includeroughened surfaces as shown in FIG. 2, or a plurality of grooves asshown in FIG. 3, or a plurality of grids.

In the step S3, the first and the second plate are closed to each other,so as to define a chamber therein between; and the chamber is evacuatedand filled with a working fluid before being sealed.

More specifically, the first plate 11 and the second plate 12 are closedto each other to form a main body 1 of the vapor chamber, whichinternally defines a chamber 14. The chamber 14 is evacuated and filledwith a working fluid before being sealed. The working fluid may bepurified water, inorganic compounds, alcohols, ketones, liquid metals,coolants, or organic compounds.

With the first method of manufacturing vapor chamber with integrallyformed wick structure, the manufacturing process for a vapor chamber iseffectively simplified to achieve the effect of saving time and labor.Moreover, the wick structure 15 integrally formed with the main body mayhave stable quality and can be differently configured according tousers' requirements.

FIG. 8 is a flowchart showing the steps included in a second method ofthe present invention for manufacturing a vapor chamber with integrallyformed wick structure according to the third embodiment of the presentinvention. Please refer to FIG. 8 along with FIG. 5A. In the secondmethod of manufacturing vapor chamber with integrally formed wickstructure, steps S1, S2, S3, and S4 are included.

In the step S1, a first plate and a second plate are provided.

In the step S2, a wick structure is formed on two facing inner surfacesof the first and the second plate by way of mechanically processing.

In the step S3, the first and the second plate are closed to each other,so as to define a chamber therein between; and the chamber is evacuatedand filled with a working fluid before being sealed.

Since the steps S1 to S3 are identical to those in the first method,they are not described in details herein. The second method is differentfrom the first method in the step S4, which is performed after the stepS1. In the step S4, at least one supporting structure is formed on aninner surface of the first facing toward the second plate or on an innersurface of the second plate facing toward the first plate by way ofmechanically processing.

More specifically, in the step S4, the first plate 11 is machined on itsinner surface facing toward the second plate 12, such as by stamping,rolling, slotting, or milling, so that at least one supporting structure17 is formed on the inner surface of the first plate 11. Alternatively,the second plate 12 is machined on its inner surface facing toward thefirst plate 1, so that at least one supporting structure 17 is formed onthe inner surface of the second plate 12. The supporting structure 17provides effective supporting to prevent the first and the second plate11, 12 from undesired deformation.

FIG. 9 is a flowchart showing the steps included in a third method ofthe present invention for manufacturing a vapor chamber with integrallyformed wick structure according to the fourth embodiment of the presentinvention. Please refer to FIG. 9 along with FIG. 6A. In the thirdmethod of manufacturing vapor chamber with integrally formed wickstructure, steps S1, S2, S3, and S5 are included.

In the step S1, a first plate and a second plate are provided.

In the step S2, a wick structure is formed on two facing inner surfacesof the first and the second plate by way of mechanically processing.

In the step S3, the first and the second plate are closed to each other,so as to define a chamber therein between; and the chamber is evacuatedand filled with a working fluid before being sealed.

Since the steps S1 to S3 are identical to those in the first method,they are not described in details herein. The third method is differentfrom the first method in the step S5, which is performed after the stepS1. In the step S5, a plurality of supporting structures is formed ontwo facing inner surfaces of the first and the second plate by way ofmechanically processing.

More specifically, in the step S5, the first plate 11 and the secondplate 12 are machined on their two facing inner surfaces, so that aplurality of supporting structures 17 is formed on the two facing innersurfaces of the first and second plates 11, 12. The supportingstructures 17 integrally formed on the two facing inner surfaces of thefirst and second plates 11, 12 not only effectively structurallyreinforce the first and the second plate 11, 12, but also provideexcellent supporting to prevent the first and the second plate 11, 12from undesired deformation.

Accordingly, compared to the prior art vapor chamber, the vapor chamberof the present invention provides the following advantages: (1) savingtime and labor for manufacturing the vapor chamber and the wickstructure thereof; (2) enabling increased yield thereof; and (3)reinforcing and protecting the main body of the vapor chamber fromdeformation.

The present invention has been described with some preferred embodimentsthereof and it is understood that many changes and modifications in thedescribed embodiments can be carried out without departing from thescope and the spirit of the invention that is intended to be limitedonly by the appended claims.

What is claimed is:
 1. A vapor chamber with integrally formed wickstructure, comprising: a main body including a first plate and a secondplate; the first plate and the second plate being closed to each other,so as to define a chamber therein between; and the chamber being filledwith a working fluid; and a wick structure being formed on two facinginner surfaces of the first and the second plate to project from thefirst and the second plate toward a central space in the chamber.
 2. Thevapor chamber with integrally formed wick structure as claimed in claim1, further comprising at least one supporting structure; the supportingstructure being formed on the inner surface of one of the first and thesecond plate having the wick structure formed thereon.
 3. The vaporchamber with integrally formed wick structure as claimed in claim 1,further comprising a plurality of supporting structures; the supportingstructures being formed on the two facing inner surfaces of the firstand the second plate having the wick structure formed thereon.
 4. Thevapor chamber with integrally formed wick structure as claimed in claim1, wherein the first plate is provided on an outer surface with a


5. The vapor chamber with integrally formed wick structure as claimed inclaim 2, wherein the first plate is provided on an outer surface with aradiating fin unit; and the radiating fin unit including a plurality ofradiating fins outward extended from the outer surface of the firstplate.
 6. The vapor chamber with integrally formed wick structure asclaimed in claim 3, wherein the first plate is provided on an outersurface with a radiating fin unit; and the radiating fin unit includinga plurality of radiating fins outward extended from the outer surface ofthe first plate.
 7. The vapor chamber with integrally formed wickstructure as claimed in claim 1, wherein the wick structure isintegrally formed on the two facing inner surfaces of the first and thesecond plate.
 8. The vapor chamber with integrally formed wick structureas claimed in claim 1, wherein the wick structure is selected from thegroup consisting of grooves, roughened surfaces, and grids.
 9. A methodof manufacturing vapor chamber with integrally formed wick structure,comprising the following steps: providing a first and a second plate;forming a wick structure on two facing inner surfaces of the first andthe second plate by way of mechanical processing; and closing the firstand the second plate to each other to thereby define a chamber thereinbetween; evacuating the chamber, filling the chamber with a workingfluid, and sealing the chamber.
 10. The method of manufacturing vaporchamber with integrally formed wick structure as claimed in claim 9,further comprising a step after the step of providing the first and thesecond plate to mechanically process an inner surface of one of thefirst and the second plate, so as to form at least one supportingstructure on the inner surface.
 11. The method of manufacturing vaporchamber with integrally formed wick structure as claimed in claim 9,further comprising a step after the step of providing the first and thesecond plate to mechanically process two facing inner surfaces of thefirst and the second plate, so as to form a plurality of supportingstructures on the two facing inner surfaces.
 12. The method ofmanufacturing vapor chamber with integrally formed wick structure asclaimed in claim 9, wherein the wick structure is selected from thegroup consisting of grooves, roughened surfaces, and grids.
 13. Themethod of manufacturing vapor chamber with integrally formed wickstructure as claimed in claim 9, wherein the mechanical processing isselected from the group consisting of stamping, rolling, slotting andmilling.